集成电路工艺原理第七章 离子注入原理 (上)INFO130024.01集成电路工艺原理 仇志军zjqiufudan.edu邯郸校区物理楼435室1大纲 第一章 前言第二章 晶体生长第三章 实验室净化及硅片清洗第四章 光刻第五章 热氧化第六章 热扩散第七章 离子注入第八章 薄膜淀积第九章 刻蚀第十章

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